Syllabus for Thin Film Technology I

Tunnfilmsteknik I

Syllabus

  • 5 credits
  • Course code: 1TE016
  • Education cycle: Second cycle
  • Main field(s) of study and in-depth level: Technology A1F, Physics A1F, Chemistry A1F

    Explanation of codes

    The code indicates the education cycle and in-depth level of the course in relation to other courses within the same main field of study according to the requirements for general degrees:

    First cycle
    G1N: has only upper-secondary level entry requirements
    G1F: has less than 60 credits in first-cycle course/s as entry requirements
    G1E: contains specially designed degree project for Higher Education Diploma
    G2F: has at least 60 credits in first-cycle course/s as entry requirements
    G2E: has at least 60 credits in first-cycle course/s as entry requirements, contains degree project for Bachelor of Arts/Bachelor of Science
    GXX: in-depth level of the course cannot be classified.

    Second cycle
    A1N: has only first-cycle course/s as entry requirements
    A1F: has second-cycle course/s as entry requirements
    A1E: contains degree project for Master of Arts/Master of Science (60 credits)
    A2E: contains degree project for Master of Arts/Master of Science (120 credits)
    AXX: in-depth level of the course cannot be classified.

  • Grading system: Fail (U), Pass (3), Pass with credit (4), Pass with distinction (5)
  • Established: 2010-03-16
  • Established by:
  • Revised: 2018-08-30
  • Revised by: The Faculty Board of Science and Technology
  • Applies from: week 30, 2019
  • Entry requirements: 130 credits within Science and Technology. Materials Analysis should have been attended.
  • Responsible department: Department of Engineering Sciences

Learning outcomes

On completion of the course, the student should be able to:

  • discuss the differences and similarities between different vacuum based deposition techniques,
  • evaluate and use models for nucleating and growth of thin films,
  • asses the relation between deposition technique, film structure, and film properties,
  • discuss typical thin film applications,
  • motivate selection of deposition techniques for various applications.

Content

Deposition by various PVD techniques such as evaporation, sputtering, ion-plating as well as chemical coating methods (CVD and ALD). Plasma technologies for thin films. Fundamental physical and chemical processes. Effect of the substrate on the film growth and techniques for surface modification. Models for nucleation and film growth. Morphology and texture and their impact on material properties. Applications of thin film materials and deposition technologies.

Instruction

Lectures, seminars and demonstrations.

Assessment

Written examination (4 credits). Laboratory demonstrations (1 credit). 
 
If there are special reasons for doing so, an examiner may make an exception from the method of assessment indicated and allow a student to be assessed by another method. An example of special reasons might be a certificate regarding special pedagogical support from the disability coordinator of the university.

Reading list

Reading list

Applies from: week 30, 2019

  • Smith, Donald L. Thin-film deposition : principles and practice

    New York: McGraw-Hill, cop. 1995

    Find in the library

  • Ohring, Milton Materials science of thin films : deposition and structure

    2. ed.: San Diego, CA: Academic Press, cop. 2002

    Find in the library