Syllabus for Thin Film Technology I
- 5 credits
- Course code: 1TE016
- Education cycle: Second cycle
Main field(s) of study and in-depth level:
Materials Engineering A1F,
Explanation of codes
The code indicates the education cycle and in-depth level of the course in relation to other courses within the same main field of study according to the requirements for general degrees:
- G1N: has only upper-secondary level entry requirements
- G1F: has less than 60 credits in first-cycle course/s as entry requirements
- G1E: contains specially designed degree project for Higher Education Diploma
- G2F: has at least 60 credits in first-cycle course/s as entry requirements
- G2E: has at least 60 credits in first-cycle course/s as entry requirements, contains degree project for Bachelor of Arts/Bachelor of Science
- GXX: in-depth level of the course cannot be classified
- A1N: has only first-cycle course/s as entry requirements
- A1F: has second-cycle course/s as entry requirements
- A1E: contains degree project for Master of Arts/Master of Science (60 credits)
- A2E: contains degree project for Master of Arts/Master of Science (120 credits)
- AXX: in-depth level of the course cannot be classified
- Grading system: Fail (U), Pass (3), Pass with credit (4), Pass with distinction (5)
- Established: 2010-03-16
- Established by:
- Revised: 2023-02-07
- Revised by: The Faculty Board of Science and Technology
- Applies from: Autumn 2023
130 credits in science/engineering. Either Surface Characterisation and attended course in Surface and Materials Analysis, or attended course in Introduction to Materials Engineering and Surface Characterisation which can be taken in parallel. Proficiency in English equivalent to the Swedish upper secondary course English 6.
- Responsible department: Department of Materials Science and Engineering
On completion of the course, the student should be able to:
- discuss the differences and similarities between different vacuum based deposition techniques,
- evaluate and use models for nucleating and growth of thin films,
- asses the relation between deposition technique, film structure, and film properties,
- discuss typical thin film applications,
- motivate selection of deposition techniques for various applications.
Surface coatings is an important area in the manufacturing industry, where the properties of a material can be improved if the surface is modified. The course teaches thin film deposition by various PVD techniques such as evaporation, sputtering, ion-plating as well as chemical coating methods (CVD and ALD). Plasma technologies for thin films. Fundamental physical and chemical processes. Effect of the substrate on the film growth and techniques for surface modification. Models for nucleation and film growth. Morphology and texture and their impact on material properties. Applications of thin film materials and deposition technologies.
Lectures, seminars and laboratory demonstrations.
Written examination (4 credits). Laboratory demonstrations (1 credit).
If there are special reasons for doing so, an examiner may make an exception from the method of assessment indicated and allow a student to be assessed by another method. An example of special reasons might be a certificate regarding special pedagogical support from the disability coordinator of the university.
- Latest syllabus (applies from Autumn 2023, version 2)
- Previous syllabus (applies from Autumn 2023, version 1)
- Previous syllabus (applies from Autumn 2022)
- Previous syllabus (applies from Spring 2020)
- Previous syllabus (applies from Autumn 2019)
- Previous syllabus (applies from Autumn 2016)
- Previous syllabus (applies from Autumn 2013)
- Previous syllabus (applies from Autumn 2011)
- Previous syllabus (applies from Autumn 2010)
Applies from: Autumn 2023
Some titles may be available electronically through the University library.
Smith, Donald L.
Thin-film deposition : principles and practice
New York: McGraw-Hill, cop. 1995
Martin, Peter M.
Handbook of deposition technologies for films and coatings : science, applications and technology
3rd ed.: Amsterdam: Elsevier Science, 2010