Sören Berg

A simple model for non-saturated reactive sputtering processes

Nyberg, Tomas; Högberg, H.; Greczynski, G.; Berg, Sören

Part of Thin Solid Films, 2019

• DOI for A simple model for non-saturated reactive sputtering processes
• Download full text (pdf) of A simple model for non-saturated reactive sputtering processes

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

p. 34-38, 2016

• DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

Part of Surface & Coatings Technology, p. 39-43, 2015

• DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Särhammar, Erik; Berg, Sören; Nyberg, Tomas

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014

• DOI for Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Upgrading the “Berg-model” for reactive sputtering processes

Berg, Sören; Särhammar, Erik; Nyberg, Tomas

Part of Thin Solid Films, p. 186-192, 2014

• DOI for Upgrading the “Berg-model” for reactive sputtering processes

A simple model for non-saturated reactive sputtering processes

Nyberg, Tomas; Högberg, H.; Greczynski, G.; Berg, Sören

Part of Thin Solid Films, 2019

• DOI for A simple model for non-saturated reactive sputtering processes
• Download full text (pdf) of A simple model for non-saturated reactive sputtering processes

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

Part of Surface & Coatings Technology, p. 39-43, 2015

• DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Särhammar, Erik; Berg, Sören; Nyberg, Tomas

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014

• DOI for Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Särhammar, Erik; Strijckmans, K.; Nyberg, Tomas; Van Steenberge, S. et al.

Part of Surface & Coatings Technology, p. 357-361, 2013

• DOI for A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Kubart, Tomas; Schmidt, R. M.; Austgen, M.; Nyberg, Tomas et al.

Part of Surface & Coatings Technology, p. 5055-5059, 2012

• DOI for Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kubart, Tomas; Aiempanakit, M; Andersson, Joakim; Nyberg, Tomas et al.

Part of Surface & Coatings Technology, 2011

• DOI for Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Austgen, M; Koehl, D; Zalden, P; Kubart, Tomas et al.

Part of Journal of Physics D, p. 345501, 2011

• DOI for Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Reactive sputtering of SiO₂–TiO₂ thin film from composite Si_x/TiO₂ targets

Liljeholm, Lina; Nyberg, Tomas; Kubart, Tomas; Roos, Arne et al.

Part of Vacuum, p. 317-321, 2010

• DOI for Reactive sputtering of SiO₂–TiO₂ thin film from composite Si_x/TiO₂ targets

Modelling of low energy ion sputtering from oxide surfaces

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

Part of Journal of Physics D, p. 205204, 2010

• DOI for Modelling of low energy ion sputtering from oxide surfaces

Modelling of sputtering yield amplification effect in reactive deposition of oxides

Kubart, Tomas; Nyberg, Tomas; Pflug, A.; Siemers, M. et al.

Part of Surface & Coatings Technology, p. 3882-3886, 2010

• DOI for Modelling of sputtering yield amplification effect in reactive deposition of oxides

Influence of the target composition on reactively sputtered titanium oxide films

Kubart, Tomas; Jensen, Jens; Nyberg, Tomas; Liljeholm, Lina et al.

Part of Vacuum, p. 1295-1298, 2009

• DOI for Influence of the target composition on reactively sputtered titanium oxide films

Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target

Severin, D; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören et al.

Part of Journal of Applied Physics, 2009

• DOI for Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target

A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Kubart, Tomas; Zhao, Shuxi; Wingqvist, Gunilla; Nyberg, Tomas et al.

Part of Journal of Physics, Conference Series, 2008

• DOI for A model of DC reactive magnetron sputtering for graded solar thermal absorbers

High rate reactive magnetron sputter deposition of titanium oxide

Kubart, Tomas; Depla, Diederik; Martin, David; Nyberg, Tomas et al.

Part of Applied Physics Letters, p. 221501, 2008

• DOI for High rate reactive magnetron sputter deposition of titanium oxide

Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Kubart, Tomas; Trinh, D. H.; Liljeholm, L.; Hultman, L. et al.

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 565-570, 2008

• DOI for Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering

Severin, Daniel; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören et al.

Part of Thin Solid Films, p. 3554-3558, 2007

• DOI for The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering

Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Kubart, Tomas; Polcar, Tomas; Kappertz, Oliver; Parreira, Nuno et al.

Part of Plasma Processes and Polymers, 2007

• DOI for Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Process Stabilization and Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides and Oxynitrides

Severin, D; Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas et al.

Part of Appl Phys Lett, 2006

Dynamic behaviour of the reactive sputtering process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Part of Thin Solid Films, p. 421-424, 2006

Fundamental understanding and modeling of reactive sputtering process

Berg, Sören; Nyberg, Tomas

Part of Thin Solid Films, p. 215-230, 2005

Eliminating the hysteresis effect for reactive sputtering processes

Nyberg, Tomas; Berg, Sören

Part of Appl Phys Lett, 2005

Model relating process variables to film electrical properties for reactively sputtered tantalum oxide thin films

Jain, P; Bhagwat, V; Rymaszewski, E J; Lu, T M et al.

Part of J Appl Phys, p. 3596-3604, 2003

Experimental and computer simulation studies of the

Engelmark, Fredrik; Westlinder, Jörgen; Nyberg, Tomas; Berg, Sören

Part of J Vac Sci Technol, p. 1981-1987, 2003

Structural and electroacoustic studies of AIN thin films during low temperature radio frequency sputter deposition

Engelmark, Fredrik; Iriarte, Gonzalo Fuentes; Katardjiev, Ilia V; Ottosson, M et al.

Part of J Vac Sci Technol, p. 2664-2669, 2001

Frequency response in pulsed DC reactive sputtering processes

Jonsson, Lars; Nyberg, Tomas; Katardjiev, Ilia; Berg, Sören

Part of Thin Solid Films, p. 43-48, 2000

Synthesis of highly oriented piezoelectric AlN films by reactive sputter deposition

Engelmark, Fredrik; Iriarte, Gonzalo Fuentes; Katardjiev, Ilia; Hårsta, Anders et al.

Part of J. Vac. Sci. Technol. A, p. 1609-1612, 2000

Dynamic simulations of pulsed reactive sputtering processes

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Part of J Vac Sci Technol, p. 503-508, 2000

Target compound layer formation during reactive sputtering

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1827-1831, 1999

Ion assisted deposition of Zn-Mg coatings by unbalanced magnetron sputtering

Shedden, B A; Katardjiev, Ilia; Berg, Sören; Samandi, M et al.

Part of Surface and Coatings Technology, p. 751-754, 1999

Preferential sputtering effects in thin film processing

Berg, Sören; Katardjiev, Ilia

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1916-1925, 1999

Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography

Jonsson, Lars; Hedlund, Christer; Katardjiev, Ilia; Berg, Sören

Part of THIN SOLID FILMS, p. 227-232, 1999

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Berg, Sören; Nyberg, Tomas; Blom, Hans-Olof; Nender, Claes

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1277-1285, 1998

Composition control by current modulation in dc-reactive sputtering

Nyberg, Tomas; Nender, Claes; Berg, Sören

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1868-1872, 1998

Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering

Macak, K; Nyberg, Tomas; Macak, P; Olsson, M K et al.

Part of J Vac Sci Technol A, p. 1286-1292, 1998

Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl-2

Hedlund, Christer; Jonsson, Lars; Katardjiev, Ilia; Berg, Sören et al.

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 686-691, 1997

Studies of reactive sputtering of multi-phase chromium nitride

Nyberg, Tomas; Skytt, P; Gålnander, Björn; Nender, Claes et al.

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 248-252, 1997

Linear arc discharge source for large area plasma processing

Bardos, Ladislav; Barankova, Hana; Berg, Sören

Part of Appl Phys Lett, p. 577-579, 1997

Preferential Sputtering Effects in the Deposition of TiAl Films by Filtered Cathodic Arc Deposition

Martin, P J; Bendavid, A; Wielunski, L S; Katardjiev, Ilia et al.

Part of Nucl Instr Phys Res B, p. 207-209, 1997

The influence of the deposition angle on the composition of reactively sputtered thin films

Nyberg, Tomas; Nender, Claes; Hogberg, H; Berg, Sören

Part of SURFACE & COATINGS TECHNOLOGY, p. 242-246, 1997

Thin film processing by the radio frequency hollow cathodes

Bardos, Ladislav; Barankova, Hana; Berg, Sören

Part of SURFACE & COATINGS TECHNOLOGY, p. 723-728, 1997

Diamond deposition in a microwave electrode discharge at reduced pressures

Bardos, Ladislav; Barankova, Hana; Lebedev, Y A; Nyberg, Tomas et al.

Part of DIAMOND AND RELATED MATERIALS, p. 224-229, 1997

Discharge disruptions in a helicon plasma source

Shamrai, K P; Virko, V F; Blom, Hans-Olof; Pavlenko, V P et al.

Part of J Vac Sci Technol A, p. 2864-2874, 1997

Characterization of the linear arc discharge (LAD) source for film deposition

Barankova, Hana; Bardos, Ladislav; Berg, Sören

Part of SURFACE & COATINGS TECHNOLOGY, p. 578-582, 1997

In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy

Nyberg, Tomas; Skytt, P; Gålnander, Björn; Nender, Claes et al.

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 145-148, 1997

A Method for the Determination of the Angular Dependence during Dry Etching

Hedlund, Christer; Strandman, Carola; Katardjiev, Ilia; Bäcklund, Ylva et al.

Part of Journal of Vacuum Science & Technology B, p. 3239, 1996

• DOI for A Method for the Determination of the Angular Dependence during Dry Etching

The radio frequency hollow cathode plasma jet arc for the film deposition

Barankova, Hana; Bardos, Ladislav; Berg, Sören

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 3033-3038, 1996

Microwave surfatron system for plasma processing

Bardos, Ladislav; Barankova, Hana; Berg, Sören

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 474-477, 1996

Linear arc discharge (LAD): A new type of hollow cathode plasma source

Barankova, Hana; Bardos, Ladislav; Nender, Claes; Berg, Sören

Part of SURFACE & COATINGS TECHNOLOGY, p. 377-380, 1996

Resputtering effects during ion beam assisted deposition and the sputter yield amplification effect

Berg, Sören; Katardjiev, Ilia

Part of Surface & Coatings Technology, p. 353-362, 1996

Synergistic sputtering effects during ion bombardment with two ion species

Berg, Sören; Katardjiev, Ilia

Part of J Vac Sci Technol, p. 831-833, 1995

Controlled topography production - True 3D simulation and experiment

Jonsson, Lars; Hedlund, Christer; Katardjiev, Ilia; Barklund, Anna et al.

Part of Vacuum, p. 971-975, 1995

Modeling of Mass Transport and Gas Kinetics of the Reactive Sputtering Process

Berg, Sören; Nender, Claes

Part of Journal de Physique IV, Colloque C5, suppl au de Jorurnal de Physique II, 5, 1995

A new method for film deposition in the discharge of target metal vapour

Bardos, Ladislav; Barankova, Hana; Berg, Sören

Part of Surface and Coatings Technology, p. 174-180, 1995

Metastable assisted deposition of TiN films

Barankova, Hana; Bardos, Ladislav; Berg, Sören

Part of Appl Phys Lett, p. 1521-1523, 1995

Abnormal High Rate Deposition of TiN Films by the Radio Frequency Plasma Jet System

Barankova, Hana; Bardos, Ladislav; Berg, Sören

Part of J Electrochem Soc, p. 883-887, 1995

Titanium nitride deposited by high rate rf hollow cathode plasma jet reactive process

Barankova, Hana; Bardos, Ladislav; Berg, Sören

Part of VACUUM, p. 1433-1438, 1995

Hysteresis effects in the sputtering process using two reactive gases

Barankova, Hana; Berg, Sören; Carlsson, Patrik; Nender, Claes

Part of Thin Solid Films, p. 181-186, 1995

Upgrading the “Berg-model” for reactive sputtering processes

Berg, Sören; Särhammar, Erik; Nyberg, Tomas

Part of Thin Solid Films, p. 186-192, 2014

• DOI for Upgrading the “Berg-model” for reactive sputtering processes

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

p. 34-38, 2016

• DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

High rate reactive magnetron sputtering of oxides using sputtering yield amplification

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2012

Sputter Yield Amplification of reactively sputtered TiO₂

Schmidt, Rüdiger; Kubart, Tomas; Austgen, Michael; Wagner, D et al.

2011

Serial magnetron co-sputtering: Sputtering yield amplification and process modelling

Kubart, Tomas; Nyberg, Tomas; Berg, Soren; Austgen, Michael et al.

Part of E-MRS 2011 Spring Meeting, 2011

Molecular dynamics simulations of low energy Ar sputtering of TiO2 surfaces

Kubart, Tomas; Arapan, Sergiu; Skorodumova, Natalia V.; Nyberg, Tomas et al.

2010

Studies of TiN films deposited by HIPIMS at different substrate temperatures and substrate bias

Hallman, R.; Andersson, J.; Särhammar, Erik; Nyberg, Tomas et al.

2010

The influence of total processing pressure on the hysteresis behaviour in reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

2010

Sputtering yield amplification in reactive sputtering

Berg, Sören; Nyberg, Tomas; Kubart, Tomas

2010

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kubart, Tomas; Aiempanakit, M.; Andersson, J.; Nyberg, Tomas et al.

2010

Sputtering Yield Amplification in Reactive Serial Co-Sputtering

Kubart, Tomas; Nyberg, Tomas; Berg, Sören; Pflug, A. et al.

2010

Stable High Rate Reactive Sputter Deposition of Aluminium Oxide from Segmented Targets of Aluminium and Aluminium Oxide

Särhammar, Erik; Nyberg, Tomas; Kubart, Tomas; Berg, Sören

Part of Presented at the International Symposium on Reactive Sputter Deposition (RSD2009),  Manchester, United Kingdom, December 10-11, 2009, 2009

Preferential Sputtering of Oxides and Target Design for Stable Reactive Magnetron Deposition of Oxides

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2009

Studies and Modelling of Surface Modifications of Different Oxides During Ion Bombardmen

Nyberg, Tomas; Kubart, Tomas; Berg, Sören

Part of Presented at the 7th Asian-European  International Conference on Plasma Surface Engineering (AEPSE 2009), Busan, South Korea,  September 20-25, 2009, 2009

Experiments and modelling of reactive sputtering using two reactive gases and two targets

Kubart, Tomas; Trinh, D H; Liljeholm, Lina; Hultman, Lars et al.

2007

On the high rate reactive sputtering of substoichiometric titanium oxide targets

Kubart, Tomas; Depla, D; Martin, David; Nyberg, Tomas et al.

2007

Novel Silicon-on-SiC Substrate with Superior Thermal and RF Performance

Olsson, Jörgen; Vallin, Örjan; Sjöblom, Gustaf; Norström, Hans et al.

Part of Proceedings IEEE SOI conference, p. 115-116, 2007

A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Kubart, Tomas; Zhao, Shuxi; Nyberg, Tomas; Berg, Sören et al.

2007

Advanced Process Modelling of the Rotating Magnetron

Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2006

Dynamic Modelling of Reactive Magnetron Sputtering

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

2006

Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Rosén, Daniel; Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas et al.

2006

State of the art in Reactive Magnetron Sputtering

Nyberg, Tomas; Kappertz, Oliver; Kubart, Tomas; Berg, Sören et al.

Part of Invited to The third Mikkeli International Industrial Coating Seminar, MIICS 2006, Mikkeli, Finland, March 16-18, 2006 and Conference Proceedings, 2006

Experimental Studies of the Dynamic Behavior of the Reactive Sputtering Process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Part of Presented at the 5th Asian-European Int. Conf. on Plasma Surface Engineering (AEPSE 2005) in Qingdao City, China, 12-16 September, 2005

Reactive Sputtering – Experiments and Modelling

Nyberg, Tomas; Berg, Sören

Part of Invited to Sweden-China Symposium on Materials Science in Beijing, China, 10-13 May, 2005

Ionenimplantation beim reaktiven Sputtern

Severin, Daniel; Wuttig, M; Kappertz, Oliver; Nyberg, Tomas et al.

Part of Presented at the 69. Annual Meeting of the Deutsche Physikalische Gesellschaft in Berlin, March, 2005

Kinetic behaviour of target poisoning during reactive sputtering

Rosén, Daniel; Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas et al.

Part of Reactive Sputter Deposition 2005 in Delft, The Netherlands, 2005

Dynamic Behaviour of the Reactive Sputtering Process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Part of Presented at 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces & Nanostructures (ICTF13/ACSIN8) in Stockholm, Sweden, 19-23 June 2005, 2005

Modelling of Sputter Erosion Rate Enchancement from Ceramic Targets

Nyberg, Tomas; Kappertz, Oliver; Rosén, Daniel; Kubart, Tomas et al.

Part of Proc of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, USA, p. 298-301, 2005

Modelling of the Plasma Impedance in Reactive Magnetron Sputtering for Various Traget Materials

Pflug, Andreas; Siemers, M; Szyszka, B; Kappertz, Oliver et al.

Part of Proceedings of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, April 23-28, p. 298-301, 2005

Ion Implantation Effects in Reactive Sputter Deposition

Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas; Berg, Sören et al.

Part of Presented at the 14th Int. Conf. on Surface Modification of Materials by Ion Beams (SMMIB’05) in Kusadasi, Turkey, 4-9 September, 2005

Modelling of Sputter Erosion Rate Enhancement from Ceramic Targets

Nyberg, Tomas; Kappertz, Oliver; Rosén, Daniel; Kubart, Tomas et al.

Part of Proceedings of Society of Vacuum Coaters, p. 324.328, 2004

A Simplified Treatment of Target Implantation Effects in Reactive Sputtering

Kappertz, Oliver; Nyberg, Tomas; Rosén, Daniel; Katardjiev, Ilia et al.

Part of The International Conference on Metallurgical Coatings and Thin Films in San Diego, USA, 2004

Advances in Heuristic and Monte-Carlo Simulation of Reactive Sputtering and Technical Application

Pflug, Andreas; Sittinger, V; Scyszka, B; Nyberg, Tomas et al.

Part of Invited to the Symposium on Reactive Sputter Processes and Related Phenomena III, Ghent, Belgium, December 9-10, 2004

Complex Target Poisoning Effects in Reactive Sputtering

Rosén, Daniel; Kappertz, Oliver; Nyberg, Tomas; Katardjiev, Ilia et al.

Part of American Vacuum Society Symposium & Exhibition, Anaheim USA, 2004

Influence of rotating magnets on hysteresis in reactive sputtering

Kappertz, Oliver; Nyberg, Tomas; Rosén, Daniel; Berg, Sören

Part of Society of Vacuum Coaters, 7th Annual Technical Conference Proceedings, April, 2004

Heuristic model of the plasma impedance in reactive magnetron sputtering

Pflug, A; Szyszka, B; Berg, Sören; Nyberg, Tomas et al.

Part of 5th International Conference on Coatings on Glass, Saarbrücken, Germany, July, 2004

TRIDYN simulation of target poisoning in reactive sputtering

Rosén, Daniel; Katardjiev, Ilia; Berg, Sören; Möller, W

Part of COSIRES, Finland, 2004

Basic Understanding of Reactive Sputtering Processes

Berg, Sören; Nyberg, Tomas

Part of Invited to the AVS 50th National Symposium in Baltimore, Maryland, USA, November 2-7, 2003, 2003

Basic Understanding of the Pulsed DC Reactive Spitter Deposition Process

Berg, Sören; Nyberg, Tomas; Katardjiev, Ilia

Part of The 4th Asian-European Int Conf on Plasma Surface Engineering, AEPSE 2003, Jeju City, South Korea, September 28-October 2, 2003, 2003

Control of reactive sputtering process using two reactive gases

Sproul, W D; Christie, D J; Carter, D C; Berg, Sören et al.

Part of Proc. of the AVS 4th International Conference on Microelectronics & Interfaces, Santa Clara, USA, p. 98-103, 2003

Stable Reactive Sputtering Processes

Nyberg, Tomas; Berg, Sören

Part of ISSP 2003, The 7th International Symposium on Sputtering & Plasma Processes, June 11-13, Kanazawa, Japan, p. 235-239, 2003

Stable reactive sputtering using 2 reactive gases

Nyberg, Tomas; Sproul, W D; Carter, K L; Berg, Sören

Part of ICMCTF 2003, The International Conference on Metallurgical Coatings and Thin Films April 28 - May 2, San Diego, USA, 2003

Integrated capacitors using reactive DC magnetron Co-sputtered (Ta2O5)1-x(TiO2)x thin films

Westlinder, Jörgen; Engelmark, Fredrik; Blom, Hans-Olof; Olsson, Jörgen et al.

Part of The AVS 2nd International Conference on Microelectronics & Interfaces, Santa Clara, USA, 2001

Simulation and dielectric characterization of reactive DC magnetron Co-sputtering of (Ta2O5)1-x(TiO2)x

Westlinder, Jörgen; Zhang, Yanwen; Engelmark, Fredrik; Blom, Hans-Olof et al.

Part of American Vacuum Society 47th National Symposium 2000 Boston, USA, 2000

Basic Understanding of the Pulsed DC Reactive Sputter Deposition Process

Berg, Sören; Jonsson, Lars; Nyberg, Tomas; Katardjiev, Ilia

Part of Invited to Second Asian-European Int Conf on Plasma Surface Engineering (AEPSE´99), Beijing, September 15-19, 1999

Ion assisted deposition of Zn-Mg coatings by unbalanced magnetron sputtering

Shedden, B; Katardjiev, Ilia; Berg, Sören; Samandi, M et al.

Part of Proc of the 6th Int Conf on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 1998

Target Compound Layer Formation during Reactive Sputtering

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Part of Presented at AVS 45th National Symposium in Baltimore, Maryland, USA, November 2-6, 1998

PECVD by hollow cathodes

Bardos, Ladislav; Barankova, Hana; Berg, Sören

Part of Proceedings of the 41st Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Boston 1998, ISSN 0737-5921, Paper P-1, Proc., p. 315-320, 1998

Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl2

Hedlund, Christer; Jonsson, Lars; Katardjiev, Ilia; Berg, Sören et al.

Part of The 43rd International Symposium of the American Vacuum Society, Philadelphia PA, USA, 1997

Characterization and optimization of a dry etching process for silicon nitride spacer formation

Jonsson, Lars; Hedlund, Christer; Larsson, T; Katardjiev, Ilia et al.

Part of The 44th international symposium of the American Vacuum Society, San José, USA, 1997

A new self aligned asymmetric lateral bipolar transistor

Jonsson, Lars; Olsson, Jörgen; Edholm, Bengt; Söderbärg, Anders et al.

Part of The 17th Nordic Semiconductor Meeting, Norway, June, 1996

A method for the determination of the angular dependence during dry etching

Hedlund, Christer; Strandman, Carola; Katardjiev, Ilia; Bäcklund, Ylva et al.

Part of The American Vacuum Society, 42nd National Symposium, Minneapolis, USA, Oct, 1995

Microwave surfatron system for diamond film depositions

Bardos, Ladislav; Barankova, Hana; Berg, Sören

Part of International Symposium on Plasma Chemistry – ISPC 12, Minneapolis, USA, August 21-25, Paper no PK 1, 1995

Compositional changes during ion-assisted deposition of TixW1-x barrier layers on structured surfaces

Berg, Sören; Jonsson, Lars; Katardjiev, Ilia

Part of The 42nd international symposium of the American Vacuum Society, San José, USA, 1995