Entry requirements

130 credits in science/engineering. Materials Analysis should have been attended.

Learning outcomes

On completion of the course, the student should be able to:

• discuss the differences and similarities between different vacuum based deposition techniques,
• evaluate and use models for nucleating and growth of thin films,
• asses the relation between deposition technique, film structure, and film properties,
• discuss typical thin film applications,
• motivate selection of deposition techniques for various applications.

Content

Deposition by various PVD techniques such as evaporation, sputtering, ion-plating as well as chemical coating methods (CVD and ALD). Plasma technologies for thin films. Fundamental physical and chemical processes. Effect of the substrate on the film growth and techniques for surface modification. Models for nucleation and film growth. Morphology and texture and their impact on material properties. Applications of thin film materials and deposition technologies.

Instruction

Lectures, seminars and demonstrations.

Assessment

Written examination (4 credits). Laboratory demonstrations (1 credit).

If there are special reasons for doing so, an examiner may make an exception from the method of assessment indicated and allow a student to be assessed by another method. An example of special reasons might be a certificate regarding special pedagogical support from the disability coordinator of the university.