Sören Berg
Professor emeritus vid Institutionen för elektroteknik; Fasta tillståndets elektronik
- Telefon:
- 018-471 31 64
- E-post:
- soren.berg@angstrom.uu.se
- Besöksadress:
- Ångströmlaboratoriet, Lägerhyddsvägen 1
75237 UPPSALA - Postadress:
- Box 65
751 03 UPPSALA
- Akademiska meriter:
- FD
Publikationer
Senaste publikationer
A simple model for non-saturated reactive sputtering processes
Ingår i Thin Solid Films, 2019
- DOI för A simple model for non-saturated reactive sputtering processes
- Ladda ner fulltext (pdf) av A simple model for non-saturated reactive sputtering processes
Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
s. 34-38, 2016
Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
Ingår i Surface & Coatings Technology, s. 39-43, 2015
Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide
Ingår i Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014
Upgrading the “Berg-model” for reactive sputtering processes
Ingår i Thin Solid Films, s. 186-192, 2014
Alla publikationer
Artiklar i tidskrift
A simple model for non-saturated reactive sputtering processes
Ingår i Thin Solid Films, 2019
- DOI för A simple model for non-saturated reactive sputtering processes
- Ladda ner fulltext (pdf) av A simple model for non-saturated reactive sputtering processes
Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
Ingår i Surface & Coatings Technology, s. 39-43, 2015
Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide
Ingår i Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014
A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination
Ingår i Surface & Coatings Technology, s. 357-361, 2013
Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Ingår i Surface & Coatings Technology, s. 5055-5059, 2012
Studies of hysteresis effect in reactive HiPIMS deposition of oxides
Ingår i Surface & Coatings Technology, 2011
Ingår i Journal of Physics D, s. 345501, 2011
Reactive sputtering of SiO2–TiO2 thin film from composite Six/TiO2 targets
Ingår i Vacuum, s. 317-321, 2010
Modelling of low energy ion sputtering from oxide surfaces
Ingår i Journal of Physics D, s. 205204, 2010
Modelling of sputtering yield amplification effect in reactive deposition of oxides
Ingår i Surface & Coatings Technology, s. 3882-3886, 2010
Ingår i Journal of Applied Physics, 2009
Influence of the target composition on reactively sputtered titanium oxide films
Ingår i Vacuum, s. 1295-1298, 2009
A model of DC reactive magnetron sputtering for graded solar thermal absorbers
Ingår i Journal of Physics, Conference Series, 2008
High rate reactive magnetron sputter deposition of titanium oxide
Ingår i Applied Physics Letters, s. 221501, 2008
Experiments and modeling of dual reactive magnetron sputtering using two reactive gases
Ingår i Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, s. 565-570, 2008
The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering
Ingår i Thin Solid Films, s. 3554-3558, 2007
Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
Ingår i Plasma Processes and Polymers, 2007
Ingår i Appl Phys Lett, 2006
Dynamic behaviour of the reactive sputtering process
Ingår i Thin Solid Films, s. 421-424, 2006
Fundamental understanding and modeling of reactive sputtering process
Ingår i Thin Solid Films, s. 215-230, 2005
Eliminating the hysteresis effect for reactive sputtering processes
Ingår i Appl Phys Lett, 2005
Ingår i J Appl Phys, s. 3596-3604, 2003
Experimental and computer simulation studies of the
Ingår i J Vac Sci Technol, s. 1981-1987, 2003
Ingår i J Vac Sci Technol, s. 2664-2669, 2001
Frequency response in pulsed DC reactive sputtering processes
Ingår i Thin Solid Films, s. 43-48, 2000
Synthesis of highly oriented piezoelectric AlN films by reactive sputter deposition
Ingår i J. Vac. Sci. Technol. A, s. 1609-1612, 2000
Dynamic simulations of pulsed reactive sputtering processes
Ingår i J Vac Sci Technol, s. 503-508, 2000
Target compound layer formation during reactive sputtering
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1827-1831, 1999
Ion assisted deposition of Zn-Mg coatings by unbalanced magnetron sputtering
Ingår i Surface and Coatings Technology, s. 751-754, 1999
Preferential sputtering effects in thin film processing
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1916-1925, 1999
Ingår i THIN SOLID FILMS, s. 227-232, 1999
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1277-1285, 1998
Composition control by current modulation in dc-reactive sputtering
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1868-1872, 1998
Ingår i J Vac Sci Technol A, s. 1286-1292, 1998
Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl-2
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 686-691, 1997
Studies of reactive sputtering of multi-phase chromium nitride
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 248-252, 1997
Linear arc discharge source for large area plasma processing
Ingår i Appl Phys Lett, s. 577-579, 1997
Preferential Sputtering Effects in the Deposition of TiAl Films by Filtered Cathodic Arc Deposition
Ingår i Nucl Instr Phys Res B, s. 207-209, 1997
The influence of the deposition angle on the composition of reactively sputtered thin films
Ingår i SURFACE & COATINGS TECHNOLOGY, s. 242-246, 1997
Thin film processing by the radio frequency hollow cathodes
Ingår i SURFACE & COATINGS TECHNOLOGY, s. 723-728, 1997
Diamond deposition in a microwave electrode discharge at reduced pressures
Ingår i DIAMOND AND RELATED MATERIALS, s. 224-229, 1997
Discharge disruptions in a helicon plasma source
Ingår i J Vac Sci Technol A, s. 2864-2874, 1997
Characterization of the linear arc discharge (LAD) source for film deposition
Ingår i SURFACE & COATINGS TECHNOLOGY, s. 578-582, 1997
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 145-148, 1997
A Method for the Determination of the Angular Dependence during Dry Etching
Ingår i Journal of Vacuum Science & Technology B, s. 3239, 1996
The radio frequency hollow cathode plasma jet arc for the film deposition
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 3033-3038, 1996
Microwave surfatron system for plasma processing
Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 474-477, 1996
Linear arc discharge (LAD): A new type of hollow cathode plasma source
Ingår i SURFACE & COATINGS TECHNOLOGY, s. 377-380, 1996
Resputtering effects during ion beam assisted deposition and the sputter yield amplification effect
Ingår i Surface & Coatings Technology, s. 353-362, 1996
Synergistic sputtering effects during ion bombardment with two ion species
Ingår i J Vac Sci Technol, s. 831-833, 1995
Controlled topography production - True 3D simulation and experiment
Ingår i Vacuum, s. 971-975, 1995
Modeling of Mass Transport and Gas Kinetics of the Reactive Sputtering Process
Ingår i Journal de Physique IV, Colloque C5, suppl au de Jorurnal de Physique II, 5, 1995
A new method for film deposition in the discharge of target metal vapour
Ingår i Surface and Coatings Technology, s. 174-180, 1995
Metastable assisted deposition of TiN films
Ingår i Appl Phys Lett, s. 1521-1523, 1995
Abnormal High Rate Deposition of TiN Films by the Radio Frequency Plasma Jet System
Ingår i J Electrochem Soc, s. 883-887, 1995
Titanium nitride deposited by high rate rf hollow cathode plasma jet reactive process
Ingår i VACUUM, s. 1433-1438, 1995
Hysteresis effects in the sputtering process using two reactive gases
Ingår i Thin Solid Films, s. 181-186, 1995
Artiklar, forskningsöversikt
Upgrading the “Berg-model” for reactive sputtering processes
Ingår i Thin Solid Films, s. 186-192, 2014
Konferensbidrag
Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
s. 34-38, 2016
High rate reactive magnetron sputtering of oxides using sputtering yield amplification
2012
Sputter Yield Amplification of reactively sputtered TiO2
2011
Serial magnetron co-sputtering: Sputtering yield amplification and process modelling
Ingår i E-MRS 2011 Spring Meeting, 2011
Molecular dynamics simulations of low energy Ar sputtering of TiO2 surfaces
2010
Studies of TiN films deposited by HIPIMS at different substrate temperatures and substrate bias
2010
The influence of total processing pressure on the hysteresis behaviour in reactive sputtering
2010
Sputtering yield amplification in reactive sputtering
2010
Studies of hysteresis effect in reactive HiPIMS deposition of oxides
2010
Sputtering Yield Amplification in Reactive Serial Co-Sputtering
2010
Ingår i Presented at the International Symposium on Reactive Sputter Deposition (RSD2009), Manchester, United Kingdom, December 10-11, 2009, 2009
2009
Studies and Modelling of Surface Modifications of Different Oxides During Ion Bombardmen
Ingår i Presented at the 7th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), Busan, South Korea, September 20-25, 2009, 2009
Experiments and modelling of reactive sputtering using two reactive gases and two targets
2007
On the high rate reactive sputtering of substoichiometric titanium oxide targets
2007
Novel Silicon-on-SiC Substrate with Superior Thermal and RF Performance
Ingår i Proceedings IEEE SOI conference, s. 115-116, 2007
A model of DC reactive magnetron sputtering for graded solar thermal absorbers
2007
Advanced Process Modelling of the Rotating Magnetron
2006
Dynamic Modelling of Reactive Magnetron Sputtering
2006
Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
2006
State of the art in Reactive Magnetron Sputtering
Ingår i Invited to The third Mikkeli International Industrial Coating Seminar, MIICS 2006, Mikkeli, Finland, March 16-18, 2006 and Conference Proceedings, 2006
Experimental Studies of the Dynamic Behavior of the Reactive Sputtering Process
Ingår i Presented at the 5th Asian-European Int. Conf. on Plasma Surface Engineering (AEPSE 2005) in Qingdao City, China, 12-16 September, 2005
Reactive Sputtering – Experiments and Modelling
Ingår i Invited to Sweden-China Symposium on Materials Science in Beijing, China, 10-13 May, 2005
Ionenimplantation beim reaktiven Sputtern
Ingår i Presented at the 69. Annual Meeting of the Deutsche Physikalische Gesellschaft in Berlin, March, 2005
Kinetic behaviour of target poisoning during reactive sputtering
Ingår i Reactive Sputter Deposition 2005 in Delft, The Netherlands, 2005
Dynamic Behaviour of the Reactive Sputtering Process
Ingår i Presented at 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces & Nanostructures (ICTF13/ACSIN8) in Stockholm, Sweden, 19-23 June 2005, 2005
Modelling of Sputter Erosion Rate Enchancement from Ceramic Targets
Ingår i Proc of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, USA, s. 298-301, 2005
Modelling of the Plasma Impedance in Reactive Magnetron Sputtering for Various Traget Materials
Ingår i Proceedings of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, April 23-28, s. 298-301, 2005
Ion Implantation Effects in Reactive Sputter Deposition
Ingår i Presented at the 14th Int. Conf. on Surface Modification of Materials by Ion Beams (SMMIB’05) in Kusadasi, Turkey, 4-9 September, 2005
Modelling of Sputter Erosion Rate Enhancement from Ceramic Targets
Ingår i Proceedings of Society of Vacuum Coaters, s. 324.328, 2004
A Simplified Treatment of Target Implantation Effects in Reactive Sputtering
Ingår i The International Conference on Metallurgical Coatings and Thin Films in San Diego, USA, 2004
Advances in Heuristic and Monte-Carlo Simulation of Reactive Sputtering and Technical Application
Ingår i Invited to the Symposium on Reactive Sputter Processes and Related Phenomena III, Ghent, Belgium, December 9-10, 2004
Complex Target Poisoning Effects in Reactive Sputtering
Ingår i American Vacuum Society Symposium & Exhibition, Anaheim USA, 2004
Influence of rotating magnets on hysteresis in reactive sputtering
Ingår i Society of Vacuum Coaters, 7th Annual Technical Conference Proceedings, April, 2004
Heuristic model of the plasma impedance in reactive magnetron sputtering
Ingår i 5th International Conference on Coatings on Glass, Saarbrücken, Germany, July, 2004
TRIDYN simulation of target poisoning in reactive sputtering
Ingår i COSIRES, Finland, 2004
Basic Understanding of Reactive Sputtering Processes
Ingår i Invited to the AVS 50th National Symposium in Baltimore, Maryland, USA, November 2-7, 2003, 2003
Basic Understanding of the Pulsed DC Reactive Spitter Deposition Process
Ingår i The 4th Asian-European Int Conf on Plasma Surface Engineering, AEPSE 2003, Jeju City, South Korea, September 28-October 2, 2003, 2003
Control of reactive sputtering process using two reactive gases
Ingår i Proc. of the AVS 4th International Conference on Microelectronics & Interfaces, Santa Clara, USA, s. 98-103, 2003
Stable Reactive Sputtering Processes
Ingår i ISSP 2003, The 7th International Symposium on Sputtering & Plasma Processes, June 11-13, Kanazawa, Japan, s. 235-239, 2003
Stable reactive sputtering using 2 reactive gases
Ingår i ICMCTF 2003, The International Conference on Metallurgical Coatings and Thin Films April 28 - May 2, San Diego, USA, 2003
Integrated capacitors using reactive DC magnetron Co-sputtered (Ta2O5)1-x(TiO2)x thin films
Ingår i The AVS 2nd International Conference on Microelectronics & Interfaces, Santa Clara, USA, 2001
Ingår i American Vacuum Society 47th National Symposium 2000 Boston, USA, 2000
Basic Understanding of the Pulsed DC Reactive Sputter Deposition Process
Ingår i Invited to Second Asian-European Int Conf on Plasma Surface Engineering (AEPSE´99), Beijing, September 15-19, 1999
Ion assisted deposition of Zn-Mg coatings by unbalanced magnetron sputtering
Ingår i Proc of the 6th Int Conf on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 1998
Target Compound Layer Formation during Reactive Sputtering
Ingår i Presented at AVS 45th National Symposium in Baltimore, Maryland, USA, November 2-6, 1998
Ingår i Proceedings of the 41st Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Boston 1998, ISSN 0737-5921, Paper P-1, Proc., s. 315-320, 1998
Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl2
Ingår i The 43rd International Symposium of the American Vacuum Society, Philadelphia PA, USA, 1997
Characterization and optimization of a dry etching process for silicon nitride spacer formation
Ingår i The 44th international symposium of the American Vacuum Society, San José, USA, 1997
A new self aligned asymmetric lateral bipolar transistor
Ingår i The 17th Nordic Semiconductor Meeting, Norway, June, 1996
A method for the determination of the angular dependence during dry etching
Ingår i The American Vacuum Society, 42nd National Symposium, Minneapolis, USA, Oct, 1995
Microwave surfatron system for diamond film depositions
Ingår i International Symposium on Plasma Chemistry – ISPC 12, Minneapolis, USA, August 21-25, Paper no PK 1, 1995
Ingår i The 42nd international symposium of the American Vacuum Society, San José, USA, 1995