Magnetron sputtering system
In addition to materials characterisation and modification, we also have the possibility to directly fabricate thin films at the Tandem laboratory. We have a customised Prevac magnetron sputtering set-up available allowing us to deposit films and coatings of various materials. Previous projects include the successful sputter-deposition of EUROFER97 and high-purity tungsten films for fusion applications, the growth of vanadium films for studies on hydrogen storage as well as the fabrication of photochromic films.
Part of Materials Research Express, 2024
- DOI for Sputter-deposition of ultra-thin film stacks from EUROFER97 and tungsten: characterisation and interaction with low-energy D and He ions
- Download full text (pdf) of Sputter-deposition of ultra-thin film stacks from EUROFER97 and tungsten: characterisation and interaction with low-energy D and He ions
Features
- 4 magnetrons, all usable at the same time allowing co-deposition of up to 4 different materials.
- 2 of the magnetrons operated in DC and 2 in RF mode; the latter permitting the deposition even from insulating sputter targets.
- Gas inlet featuring 3 mass flow controllers enabling reactive sputtering with one gas or a mixture of gases.
- Maximum substrate size: ∅ 50.8 mm (2'').
- Rotatable sample stage to ensure uniformity of the produced films.
- Heating stages in the load-lock and main chamber allowing for in-situ annealing.
- In-situ monitoring of deposition rates possible with a quartz crystal microbalance (QCM) installed inside the sputtering chamber.
- Base pressure in the sputtering chamber: < 10-7 mbar.
Contact
- For general questions about the laboratory, please email:
- tandemlaboratoriet@physics.uu.se