Tomas Nyberg

The Radio & Plasma Wave Investigation (RPWI) for the JUpiter ICy moons Explorer (JUICE)

Wahlund, Jan-Erik; Bergman, Jan E. S.; Åhlén, Lennart; Puccio, Walter et al.

Ingår i Space Science Reviews, 2025

• DOI för The Radio & Plasma Wave Investigation (RPWI) for the JUpiter ICy moons Explorer (JUICE)
• Ladda ner fulltext (pdf) av The Radio & Plasma Wave Investigation (RPWI) for the JUpiter ICy moons Explorer (JUICE)

Wafer-Scale Ag₂S-based Memristive Crossbar Arrays with Ultra-low Switching-energies Reaching Biological Synapses

Zhu, Yuan; Nyberg, Tomas; Nyholm, Leif; Primetzhofer, Daniel et al.

Ingår i Nano-Micro Letters, 2024

• DOI för Wafer-Scale Ag₂S-based Memristive Crossbar Arrays with Ultra-low Switching-energies Reaching Biological Synapses
• Ladda ner fulltext (pdf) av Wafer-Scale Ag₂S-based Memristive Crossbar Arrays with Ultra-low Switching-energies Reaching Biological Synapses

Wafer-sized WS2 monolayer deposition by sputtering

Villamayor, Michelle Marie S.; Husain, Sajid; Oropesa-Nuñez, Reinier; Johansson, Fredrik et al.

Ingår i Nanoscale, s. 6331-6338, 2022

• DOI för Wafer-sized WS2 monolayer deposition by sputtering
• Ladda ner fulltext (pdf) av Wafer-sized WS2 monolayer deposition by sputtering

High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching

Zhu, Yuan; Liang, Jia-sheng; Mathayan, Vairavel; Nyberg, Tomas et al.

Ingår i ACS Applied Materials and Interfaces, s. 21173-21180, 2022

• DOI för High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching
• Ladda ner fulltext (pdf) av High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching

Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation

Pham, Ngan Hoang; Yao, Yao; Wen, Chenyu; Li, Shiyu et al.

Ingår i ACS Nano, s. 17938-17946, 2021

• DOI för Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation
• Ladda ner fulltext (pdf) av Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation

Wafer-Scale Ag₂S-based Memristive Crossbar Arrays with Ultra-low Switching-energies Reaching Biological Synapses

Zhu, Yuan; Nyberg, Tomas; Nyholm, Leif; Primetzhofer, Daniel et al.

Ingår i Nano-Micro Letters, 2024

• DOI för Wafer-Scale Ag₂S-based Memristive Crossbar Arrays with Ultra-low Switching-energies Reaching Biological Synapses
• Ladda ner fulltext (pdf) av Wafer-Scale Ag₂S-based Memristive Crossbar Arrays with Ultra-low Switching-energies Reaching Biological Synapses

Wafer-sized WS2 monolayer deposition by sputtering

Villamayor, Michelle Marie S.; Husain, Sajid; Oropesa-Nuñez, Reinier; Johansson, Fredrik et al.

Ingår i Nanoscale, s. 6331-6338, 2022

• DOI för Wafer-sized WS2 monolayer deposition by sputtering
• Ladda ner fulltext (pdf) av Wafer-sized WS2 monolayer deposition by sputtering

High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching

Zhu, Yuan; Liang, Jia-sheng; Mathayan, Vairavel; Nyberg, Tomas et al.

Ingår i ACS Applied Materials and Interfaces, s. 21173-21180, 2022

• DOI för High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching
• Ladda ner fulltext (pdf) av High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching

Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation

Pham, Ngan Hoang; Yao, Yao; Wen, Chenyu; Li, Shiyu et al.

Ingår i ACS Nano, s. 17938-17946, 2021

• DOI för Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation
• Ladda ner fulltext (pdf) av Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation

Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide

Bilousov, Oleksandr V.; Voznyi, Andrii; Landeke-Wilsmark, Björn; Villamayor, Michelle Marie S. et al.

Ingår i Chemistry of Materials, s. 2901-2912, 2021

• DOI för Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide
• Ladda ner fulltext (pdf) av Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide

On the description of metal ion return in reactive high power impulse magnetron sputtering

Kubart, Tomas; Fernandes, Daniel Filipe Félix; Nyberg, Tomas

Ingår i Surface & Coatings Technology, 2021

• DOI för On the description of metal ion return in reactive high power impulse magnetron sputtering
• Ladda ner fulltext (pdf) av On the description of metal ion return in reactive high power impulse magnetron sputtering

Growth of two-dimensional WS2 thin films by reactive sputtering

Villamayor, Michelle Marie S.; Lindblad, Andreas; Johansson, Fredrik; Tran, Tuan et al.

Ingår i Vacuum, 2021

• DOI för Growth of two-dimensional WS2 thin films by reactive sputtering

Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics

Prusakova, Lucie; Hubik, Pavel; Aijaz, Asim; Nyberg, Tomas et al.

Ingår i Coatings, 2020

• DOI för Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics
• Ladda ner fulltext (pdf) av Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics

Electronic excitation of transition metal nitrides by light ions with keV energies

Bruckner, Barbara; Hans, Marcus; Nyberg, Tomas; Greczynski, Grzegorz et al.

Ingår i Journal of Physics, 2020

• DOI för Electronic excitation of transition metal nitrides by light ions with keV energies

Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis

Komander, Kristina; Moro, Marcos V.; Droulias, Sotirios A.; Müggenburg, J. et al.

Ingår i Nuclear Instruments and Methods in Physics Research Section B, s. 57-60, 2019

• DOI för Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis

On the Z(1)-dependence of electronic stopping in TiN

Sortica, Mauricio A.; Paneta, Valentina; Bruckner, Barbara; Lohmann, Svenja et al.

Ingår i Scientific Reports, 2019

• DOI för On the Z(1)-dependence of electronic stopping in TiN
• Ladda ner fulltext (pdf) av On the Z(1)-dependence of electronic stopping in TiN

A simple model for non-saturated reactive sputtering processes

Nyberg, Tomas; Högberg, H.; Greczynski, G.; Berg, Sören

Ingår i Thin Solid Films, 2019

• DOI för A simple model for non-saturated reactive sputtering processes
• Ladda ner fulltext (pdf) av A simple model for non-saturated reactive sputtering processes

Composition, structure and magnetic properties of ultra-thin Fe/Ni multilayers sputter deposited on epitaxial Cu/Si(001)

Frisk, Andreas; Ali, Hasan; Svedlindh, Peter; Leifer, Klaus et al.

Ingår i Thin Solid Films, s. 117-125, 2018

• DOI för Composition, structure and magnetic properties of ultra-thin Fe/Ni multilayers sputter deposited on epitaxial Cu/Si(001)

Minimizing sputter-induced damage during deposition of WS₂ onto graphene

Johansson, Fredrik; Ahlberg, Patrik; Jansson, Ulf; Zhang, Shi-Li et al.

Ingår i Applied Physics Letters, 2017

• DOI för Minimizing sputter-induced damage during deposition of WS₂ onto graphene
• Ladda ner fulltext 1 (pdf) av Minimizing sputter-induced damage during deposition of WS₂ onto graphene
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Electronic energy-loss mechanisms for H, He, and Ne in TiN

Sortica, Mauricio A.; Paneta, Valentina; Bruckner, Barbara; Lohmann, Svenja et al.

Ingår i Physical Review A: covering atomic, molecular, and optical physics and quantum information, 2017

• DOI för Electronic energy-loss mechanisms for H, He, and Ne in TiN

Toward synthesis of oxide films on graphene with sputtering based processes

Ahlberg, Patrik; Nyberg, Tomas; Zhang, Shi-Li; Zhang, Zhi-Bin et al.

Ingår i Journal of Vacuum Science & Technology B, 2016

• DOI för Toward synthesis of oxide films on graphene with sputtering based processes

Defect formation in graphene during low-energy ion bombardment

Ahlberg, Patrik; Johansson, Fredrik; Zhang, Zhibin; Jansson, Ulf et al.

Ingår i APL Materials, 2016

• DOI för Defect formation in graphene during low-energy ion bombardment
• Ladda ner fulltext (pdf) av Defect formation in graphene during low-energy ion bombardment

Massive Ta diffusion observed in Cu thin films but not in Ag counterparts

Mardani, Shabnam; Norström, Hans; Gustavsson, Fredrik; Nyberg, Tomas et al.

Ingår i Journal of Vacuum Science & Technology B, 2016

• DOI för Massive Ta diffusion observed in Cu thin films but not in Ag counterparts

Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure

Mao, Fang; Nyberg, Tomas; Thersleff, Thomas; Andersson, Anna et al.

Ingår i Materials & design, s. 132-142, 2016

• DOI för Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure
• Ladda ner fulltext (pdf) av Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure

Architectured columns with a metal-dielectric periodic nanostructure

Martin, Nicolas; Cacucci, Arnaud; Potin, Valerie; Imhoff, Luc et al.

Ingår i Materials letters (General ed.), s. 128-131, 2016

• DOI för Architectured columns with a metal-dielectric periodic nanostructure

Hard and elastic epitaxial ZrB2 thin films on Al2O3(0001) substrates deposited by magnetron sputtering from a ZrB2 compound target

Tengdelius, Lina; Broitman, Esteban; Lu, Jun; Eriksson, Fredrik et al.

Ingår i Acta Materialia, s. 166-172, 2016

• DOI för Hard and elastic epitaxial ZrB2 thin films on Al2O3(0001) substrates deposited by magnetron sputtering from a ZrB2 compound target

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

Ingår i Surface & Coatings Technology, s. 39-43, 2015

• DOI för Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Sputter Rate Distribution and Compositional Variations in Films Sputtered from Elemental and Multi-Element Targets at Different Pressures

Särhammar, Erik; Strandberg, Erik; Martin, Nicolas; Nyberg, Tomas

Ingår i International Journal of Materials Science and Applications, s. 29-36, 2014

Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Nyberg, Tomas et al.

Ingår i Surface & Coatings Technology, s. 86-94, 2014

• DOI för Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings
• Ladda ner fulltext (pdf) av Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings

Tribochemical formation of sulphide tribofilms from a Ti-C-S coating sliding against different counter surfaces

Nyberg, Harald; Sundberg, Jill; Särhammar, Erik; Nyberg, Tomas et al.

Ingår i Tribology letters, s. 563-572, 2014

• DOI för Tribochemical formation of sulphide tribofilms from a Ti-C-S coating sliding against different counter surfaces

Low temperature electronic transport in sputter deposited a-IGZO films

Martin, Nicolas; Nyberg, Tomas; Kapaklis, Vassilios

Ingår i Current applied physics, s. 1481-1485, 2014

• DOI för Low temperature electronic transport in sputter deposited a-IGZO films

Flexible Thin-Flm Transistors on Planarized Parylene Substrate with Recessed Individual Backgates

Farkas, Balazs; Nyberg, Tomas; Nanai, Laszlo

Ingår i Solid-State Electronics, s. 11-14, 2014

• DOI för Flexible Thin-Flm Transistors on Planarized Parylene Substrate with Recessed Individual Backgates

Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Särhammar, Erik; Berg, Sören; Nyberg, Tomas

Ingår i Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014

• DOI för Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Mechanisms for compositional variations of coatings sputtered from a WS2 target

Särhammar, Erik; Strandberg, Erik; Sundberg, Jill; Nyberg, Harald et al.

Ingår i Surface & Coatings Technology, s. 186-190, 2014

• DOI för Mechanisms for compositional variations of coatings sputtered from a WS2 target

Infiltration of Spiro-MeOTAD hole transporting material into nanotubular TiO2 electrode for solid-state dye-sensitized solar cells

Kuzmych, Oleksandr; Johansson, Erik M. J.; Nonomura, Kazuteru; Nyberg, Tomas et al.

Ingår i Materials Science & Engineering, s. 67-74, 2014

• DOI för Infiltration of Spiro-MeOTAD hole transporting material into nanotubular TiO2 electrode for solid-state dye-sensitized solar cells

Tribochemically Active Ti–C–S Nanocomposite Coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Kádas, Krisztina et al.

Ingår i Materials Research Letters, s. 148-155, 2013

• DOI för Tribochemically Active Ti–C–S Nanocomposite Coatings
• Ladda ner fulltext (pdf) av Tribochemically Active Ti–C–S Nanocomposite Coatings

Influence of Ti addition on the structure and properties of low-friction W–S–C coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Gustavsson, Fredrik et al.

Ingår i Surface & Coatings Technology, s. 340-348, 2013

• DOI för Influence of Ti addition on the structure and properties of low-friction W–S–C coatings

Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings

Nyberg, Harald; Sundberg, Jill; Särhammar, Erik; Gustavsson, Fredrik et al.

Ingår i Wear, s. 987-997, 2013

• DOI för Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings

Novel Zn-Doped Al2O3 Charge Storage Medium for Light-Erasable In-Ga-Zn-O TFT Memory

Chen, S.; Cui, X-M; Ding, S-J; Sun, Q-Q et al.

Ingår i IEEE Electron Device Letters, s. 1008-1010, 2013

• DOI för Novel Zn-Doped Al2O3 Charge Storage Medium for Light-Erasable In-Ga-Zn-O TFT Memory

A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Särhammar, Erik; Strijckmans, K.; Nyberg, Tomas; Van Steenberge, S. et al.

Ingår i Surface & Coatings Technology, s. 357-361, 2013

• DOI för A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Anisotropic electrical resistivity during annealing of oriented columnar titanium films

Martin, Nicolas; Sauget, Jeremie; Nyberg, Tomas

Ingår i Materials letters (General ed.), s. 20-23, 2013

• DOI för Anisotropic electrical resistivity during annealing of oriented columnar titanium films

The interdependence of structural and electrical properties in TiO2/TiO/Ti periodic multilayers

Cacucci, Arnaud; Tsiaoussis, Ioannis; Potin, Valerie; Imhoff, Luc et al.

Ingår i Acta Materialia, s. 4215-4225, 2013

• DOI för The interdependence of structural and electrical properties in TiO2/TiO/Ti periodic multilayers

Unique UV-Erasable In-Ga-Zn-O TFT Memory With Self-Assembled Pt Nanocrystals

Cui, Xing-Mei; Chen, Sun; Ding, Shi-Jin; Sun, Qing-Qing et al.

Ingår i IEEE Electron Device Letters, s. 1011-1013, 2013

• DOI för Unique UV-Erasable In-Ga-Zn-O TFT Memory With Self-Assembled Pt Nanocrystals

Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Kubart, Tomas; Schmidt, R. M.; Austgen, M.; Nyberg, Tomas et al.

Ingår i Surface & Coatings Technology, s. 5055-5059, 2012

• DOI för Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Defect minimization and morphology optimization in TiO2 nanotube thin films, grown on transparent conducting substrate, for dye synthesized solar cell application

Kuzmych, Oleksandr; Nonomura, Kazuteru; Johansson, Erik M. J.; Nyberg, Tomas et al.

Ingår i Thin Solid Films, s. 71-78, 2012

• DOI för Defect minimization and morphology optimization in TiO2 nanotube thin films, grown on transparent conducting substrate, for dye synthesized solar cell application

Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness

Gao, Xindong; Andersson, Joakim; Kubart, Tomas; Nyberg, Tomas et al.

Ingår i Electrochemical and solid-state letters, 2011

• DOI för Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kubart, Tomas; Aiempanakit, M; Andersson, Joakim; Nyberg, Tomas et al.

Ingår i Surface & Coatings Technology, 2011

• DOI för Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Austgen, M; Koehl, D; Zalden, P; Kubart, Tomas et al.

Ingår i Journal of Physics D, s. 345501, 2011

• DOI för Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness

Gao, Xindong; Andersson, Joakim; Kubart, Tomas; Nyberg, Tomas et al.

Ingår i Electrochemical and solid-state letters, 2011

Modelling of sputtering yield amplification effect in reactive deposition of oxides

Kubart, Tomas; Nyberg, Tomas; Pflug, A.; Siemers, M. et al.

Ingår i Surface & Coatings Technology, s. 3882-3886, 2010

• DOI för Modelling of sputtering yield amplification effect in reactive deposition of oxides

Reactive sputtering of SiO₂–TiO₂ thin film from composite Si_x/TiO₂ targets

Liljeholm, Lina; Nyberg, Tomas; Kubart, Tomas; Roos, Arne et al.

Ingår i Vacuum, s. 317-321, 2010

• DOI för Reactive sputtering of SiO₂–TiO₂ thin film from composite Si_x/TiO₂ targets

Modelling of low energy ion sputtering from oxide surfaces

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

Ingår i Journal of Physics D, s. 205204, 2010

• DOI för Modelling of low energy ion sputtering from oxide surfaces

Influence of the target composition on reactively sputtered titanium oxide films

Kubart, Tomas; Jensen, Jens; Nyberg, Tomas; Liljeholm, Lina et al.

Ingår i Vacuum, s. 1295-1298, 2009

• DOI för Influence of the target composition on reactively sputtered titanium oxide films

Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target

Severin, D; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören et al.

Ingår i Journal of Applied Physics, 2009

• DOI för Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target

A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Kubart, Tomas; Zhao, Shuxi; Wingqvist, Gunilla; Nyberg, Tomas et al.

Ingår i Journal of Physics, Conference Series, 2008

• DOI för A model of DC reactive magnetron sputtering for graded solar thermal absorbers

High rate reactive magnetron sputter deposition of titanium oxide

Kubart, Tomas; Depla, Diederik; Martin, David; Nyberg, Tomas et al.

Ingår i Applied Physics Letters, s. 221501, 2008

• DOI för High rate reactive magnetron sputter deposition of titanium oxide

Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Kubart, Tomas; Trinh, D. H.; Liljeholm, L.; Hultman, L. et al.

Ingår i Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, s. 565-570, 2008

• DOI för Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films

Trinh, D H; Kubart, Tomas; Nyberg, Tomas; Ottosson, M et al.

Ingår i Thin Solid Films, s. 8352-8358, 2008

• DOI för Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films

The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering

Severin, Daniel; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören et al.

Ingår i Thin Solid Films, s. 3554-3558, 2007

• DOI för The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering

Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Kubart, Tomas; Polcar, Tomas; Kappertz, Oliver; Parreira, Nuno et al.

Ingår i Plasma Processes and Polymers, 2007

• DOI för Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Process Stabilization and Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides and Oxynitrides

Severin, D; Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas et al.

Ingår i Appl Phys Lett, 2006

Dynamic behaviour of the reactive sputtering process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Ingår i Thin Solid Films, s. 421-424, 2006

Fundamental understanding and modeling of reactive sputtering process

Berg, Sören; Nyberg, Tomas

Ingår i Thin Solid Films, s. 215-230, 2005

Eliminating the hysteresis effect for reactive sputtering processes

Nyberg, Tomas; Berg, Sören

Ingår i Appl Phys Lett, 2005

Deposition of Ti2AIC and Ti3AIC2 epitaxial films by magnetron sputtering

Wilhelmsson, Ola; Palmquist, Jens-Petter; Nyberg, Tomas; Jansson, Ulf

Ingår i Applied Physics Letters, s. 1066-1067, 2004

Experimental and computer simulation studies of the

Engelmark, Fredrik; Westlinder, Jörgen; Nyberg, Tomas; Berg, Sören

Ingår i J Vac Sci Technol, s. 1981-1987, 2003

Frequency response in pulsed DC reactive sputtering processes

Jonsson, Lars; Nyberg, Tomas; Katardjiev, Ilia; Berg, Sören

Ingår i Thin Solid Films, s. 43-48, 2000

Dynamic simulations of pulsed reactive sputtering processes

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Ingår i J Vac Sci Technol, s. 503-508, 2000

Target compound layer formation during reactive sputtering

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1827-1831, 1999

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Berg, Sören; Nyberg, Tomas; Blom, Hans-Olof; Nender, Claes

Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1277-1285, 1998

Composition control by current modulation in dc-reactive sputtering

Nyberg, Tomas; Nender, Claes; Berg, Sören

Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 1868-1872, 1998

Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering

Macak, K; Nyberg, Tomas; Macak, P; Olsson, M K et al.

Ingår i J Vac Sci Technol A, s. 1286-1292, 1998

Studies of reactive sputtering of multi-phase chromium nitride

Nyberg, Tomas; Skytt, P; Gålnander, Björn; Nender, Claes et al.

Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 248-252, 1997

Probe depth variation in grazing exit soft-X-ray emission spectroscopy

Skytt, P; Gålander, Björn; Nyberg, Tomas; Nordgren, Joseph et al.

Ingår i NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, s. 558-562, 1997

In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy

Nyberg, Tomas; Skytt, P; Gålnander, Björn; Nender, Claes et al.

Ingår i JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, s. 145-148, 1997

Diamond deposition in a microwave electrode discharge at reduced pressures

Bardos, Ladislav; Barankova, Hana; Lebedev, Y A; Nyberg, Tomas et al.

Ingår i DIAMOND AND RELATED MATERIALS, s. 224-229, 1997

Diamond deposition from halogenated methane precursors on Si and SiC substrates

Nyberg, Tomas; Heszler, Peter; Carlsson, Jan-Otto

Ingår i Diamond and Related Materials, s. 85-88, 1997

The influence of the deposition angle on the composition of reactively sputtered thin films

Nyberg, Tomas; Nender, Claes; Hogberg, H; Berg, Sören

Ingår i SURFACE & COATINGS TECHNOLOGY, s. 242-246, 1997

The Radio & Plasma Wave Investigation (RPWI) for the JUpiter ICy moons Explorer (JUICE)

Wahlund, Jan-Erik; Bergman, Jan E. S.; Åhlén, Lennart; Puccio, Walter et al.

Ingår i Space Science Reviews, 2025

• DOI för The Radio & Plasma Wave Investigation (RPWI) for the JUpiter ICy moons Explorer (JUICE)
• Ladda ner fulltext (pdf) av The Radio & Plasma Wave Investigation (RPWI) for the JUpiter ICy moons Explorer (JUICE)

Upgrading the “Berg-model” for reactive sputtering processes

Berg, Sören; Särhammar, Erik; Nyberg, Tomas

Ingår i Thin Solid Films, s. 186-192, 2014

• DOI för Upgrading the “Berg-model” for reactive sputtering processes

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

s. 34-38, 2016

• DOI för Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Magnetron sputtering of InGaZnO and ZnSnO amorphous oxide semiconductors

Prusakova, Lucie; Aijaz, Asim; Nyberg, Tomas; Törndahl, Tobias et al.

Ingår i E-MRS Spring meeting 2015, May 11-15, Lille, France, 2015

Gas flow sputtering of Cu(In,Ga)Se-2 for thin film solar cells

Edoff, Marika; Lindahl, Johan; Wätjen, Timo; Nyberg, Tomas

Ingår i 2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2015

Tribochemically active Ti-C-S nanocomposites – a new concept for self-lubricating coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Kádas, Krisztina et al.

2013

Tribochemically active Ti-C-S coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Nyberg, Tomas et al.

2013

Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings

Nyberg, Harald; Sundberg, Jill; Särhammar, Erik; Gustavsson, Fredrik et al.

Ingår i 19th International Conference on Wear of Materials 2013; 14-18 April 2013; Portland, OR, USA, 2013

Sulfur-doping of nc-TiC/a-C films by reactive sputtering

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Nyberg, Tomas et al.

Ingår i Thirteenth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 10-14 September 2012, 2012

Mechanisms responsible for compositional variations of films sputtered from a WS2 target

Särhammar, Erik; Sundberg, Jill; Nyberg, Harald; Kubart, Tomas et al.

Ingår i International Conference on Metallurgical Coatings and Thin films (ICMCTF) 23-27/04 2012, San Diego, abstract number:428, 2012

High rate reactive magnetron sputtering of oxides using sputtering yield amplification

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2012

Quaternary W-S-C-Ti films for tribological applications

Sundberg, Jill; Särhammar, Erik; Nyberg, Harald; Kubart, Tomas et al.

2011

Sputter Yield Amplification of reactively sputtered TiO₂

Schmidt, Rüdiger; Kubart, Tomas; Austgen, Michael; Wagner, D et al.

2011

Serial magnetron co-sputtering: Sputtering yield amplification and process modelling

Kubart, Tomas; Nyberg, Tomas; Berg, Soren; Austgen, Michael et al.

Ingår i E-MRS 2011 Spring Meeting, 2011

Molecular dynamics simulations of low energy Ar sputtering of TiO2 surfaces

Kubart, Tomas; Arapan, Sergiu; Skorodumova, Natalia V.; Nyberg, Tomas et al.

2010

Sputtering Yield Amplification in Reactive Serial Co-Sputtering

Kubart, Tomas; Nyberg, Tomas; Berg, Sören; Pflug, A. et al.

2010

The influence of total processing pressure on the hysteresis behaviour in reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

2010

Sputtering yield amplification in reactive sputtering

Berg, Sören; Nyberg, Tomas; Kubart, Tomas

2010

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kubart, Tomas; Aiempanakit, M.; Andersson, J.; Nyberg, Tomas et al.

2010

Studies of TiN films deposited by HIPIMS at different substrate temperatures and substrate bias

Hallman, R.; Andersson, J.; Särhammar, Erik; Nyberg, Tomas et al.

2010

Preferential Sputtering of Oxides and Target Design for Stable Reactive Magnetron Deposition of Oxides

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2009

Studies and Modelling of Surface Modifications of Different Oxides During Ion Bombardmen

Nyberg, Tomas; Kubart, Tomas; Berg, Sören

Ingår i Presented at the 7th Asian-European  International Conference on Plasma Surface Engineering (AEPSE 2009), Busan, South Korea,  September 20-25, 2009, 2009

Stable High Rate Reactive Sputter Deposition of Aluminium Oxide from Segmented Targets of Aluminium and Aluminium Oxide

Särhammar, Erik; Nyberg, Tomas; Kubart, Tomas; Berg, Sören

Ingår i Presented at the International Symposium on Reactive Sputter Deposition (RSD2009),  Manchester, United Kingdom, December 10-11, 2009, 2009

Decorative Oxide Coatings: Colour Control by Compositional Gradient

Kubart, Tomas; Nyberg, Tomas; Polcar, T; Cavaleiro, A et al.

Ingår i E-MRS 2009, Spring Meeting in Strasbourgh, France, June 8-12, 2009, 2009

A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Kubart, Tomas; Zhao, Shuxi; Nyberg, Tomas; Berg, Sören et al.

2007

Experiments and modelling of reactive sputtering using two reactive gases and two targets

Kubart, Tomas; Trinh, D H; Liljeholm, Lina; Hultman, Lars et al.

2007

On the high rate reactive sputtering of substoichiometric titanium oxide targets

Kubart, Tomas; Depla, D; Martin, David; Nyberg, Tomas et al.

2007

Dynamic Modelling of Reactive Magnetron Sputtering

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

2006

Advanced Process Modelling of the Rotating Magnetron

Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2006

State of the art in Reactive Magnetron Sputtering

Nyberg, Tomas; Kappertz, Oliver; Kubart, Tomas; Berg, Sören et al.

Ingår i Invited to The third Mikkeli International Industrial Coating Seminar, MIICS 2006, Mikkeli, Finland, March 16-18, 2006 and Conference Proceedings, 2006

Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Rosén, Daniel; Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas et al.

2006

Kinetic behaviour of target poisoning during reactive sputtering

Rosén, Daniel; Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas et al.

Ingår i Reactive Sputter Deposition 2005 in Delft, The Netherlands, 2005

Experimental Studies of the Dynamic Behavior of the Reactive Sputtering Process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Ingår i Presented at the 5th Asian-European Int. Conf. on Plasma Surface Engineering (AEPSE 2005) in Qingdao City, China, 12-16 September, 2005

Reactive Sputtering – Experiments and Modelling

Nyberg, Tomas; Berg, Sören

Ingår i Invited to Sweden-China Symposium on Materials Science in Beijing, China, 10-13 May, 2005

Ion Implantation Effects in Reactive Sputter Deposition

Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas; Berg, Sören et al.

Ingår i Presented at the 14th Int. Conf. on Surface Modification of Materials by Ion Beams (SMMIB’05) in Kusadasi, Turkey, 4-9 September, 2005

Ionenimplantation beim reaktiven Sputtern

Severin, Daniel; Wuttig, M; Kappertz, Oliver; Nyberg, Tomas et al.

Ingår i Presented at the 69. Annual Meeting of the Deutsche Physikalische Gesellschaft in Berlin, March, 2005

Dynamic Behaviour of the Reactive Sputtering Process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Ingår i Presented at 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces & Nanostructures (ICTF13/ACSIN8) in Stockholm, Sweden, 19-23 June 2005, 2005

Modelling of Sputter Erosion Rate Enchancement from Ceramic Targets

Nyberg, Tomas; Kappertz, Oliver; Rosén, Daniel; Kubart, Tomas et al.

Ingår i Proc of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, USA, s. 298-301, 2005

Modelling of the Plasma Impedance in Reactive Magnetron Sputtering for Various Traget Materials

Pflug, Andreas; Siemers, M; Szyszka, B; Kappertz, Oliver et al.

Ingår i Proceedings of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, April 23-28, s. 298-301, 2005

A Simplified Treatment of Target Implantation Effects in Reactive Sputtering

Kappertz, Oliver; Nyberg, Tomas; Rosén, Daniel; Katardjiev, Ilia et al.

Ingår i The International Conference on Metallurgical Coatings and Thin Films in San Diego, USA, 2004

Advances in Heuristic and Monte-Carlo Simulation of Reactive Sputtering and Technical Application

Pflug, Andreas; Sittinger, V; Scyszka, B; Nyberg, Tomas et al.

Ingår i Invited to the Symposium on Reactive Sputter Processes and Related Phenomena III, Ghent, Belgium, December 9-10, 2004

Modelling of Sputter Erosion Rate Enhancement from Ceramic Targets

Nyberg, Tomas; Kappertz, Oliver; Rosén, Daniel; Kubart, Tomas et al.

Ingår i Proceedings of Society of Vacuum Coaters, s. 324.328, 2004

Influence of rotating magnets on hysteresis in reactive sputtering

Kappertz, Oliver; Nyberg, Tomas; Rosén, Daniel; Berg, Sören

Ingår i Society of Vacuum Coaters, 7th Annual Technical Conference Proceedings, April, 2004

Complex Target Poisoning Effects in Reactive Sputtering

Rosén, Daniel; Kappertz, Oliver; Nyberg, Tomas; Katardjiev, Ilia et al.

Ingår i American Vacuum Society Symposium & Exhibition, Anaheim USA, 2004

Heuristic model of the plasma impedance in reactive magnetron sputtering

Pflug, A; Szyszka, B; Berg, Sören; Nyberg, Tomas et al.

Ingår i 5th International Conference on Coatings on Glass, Saarbrücken, Germany, July, 2004

Basic Understanding of the Pulsed DC Reactive Spitter Deposition Process

Berg, Sören; Nyberg, Tomas; Katardjiev, Ilia

Ingår i The 4th Asian-European Int Conf on Plasma Surface Engineering, AEPSE 2003, Jeju City, South Korea, September 28-October 2, 2003, 2003

Basic Understanding of Reactive Sputtering Processes

Berg, Sören; Nyberg, Tomas

Ingår i Invited to the AVS 50th National Symposium in Baltimore, Maryland, USA, November 2-7, 2003, 2003

Stable reactive sputtering using 2 reactive gases

Nyberg, Tomas; Sproul, W D; Carter, K L; Berg, Sören

Ingår i ICMCTF 2003, The International Conference on Metallurgical Coatings and Thin Films April 28 - May 2, San Diego, USA, 2003

Control of reactive sputtering process using two reactive gases

Sproul, W D; Christie, D J; Carter, D C; Berg, Sören et al.

Ingår i Proc. of the AVS 4th International Conference on Microelectronics & Interfaces, Santa Clara, USA, s. 98-103, 2003

Stable Reactive Sputtering Processes

Nyberg, Tomas; Berg, Sören

Ingår i ISSP 2003, The 7th International Symposium on Sputtering & Plasma Processes, June 11-13, Kanazawa, Japan, s. 235-239, 2003

Basic Understanding of the Pulsed DC Reactive Sputter Deposition Process

Berg, Sören; Jonsson, Lars; Nyberg, Tomas; Katardjiev, Ilia

Ingår i Invited to Second Asian-European Int Conf on Plasma Surface Engineering (AEPSE´99), Beijing, September 15-19, 1999

Target Compound Layer Formation during Reactive Sputtering

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Ingår i Presented at AVS 45th National Symposium in Baltimore, Maryland, USA, November 2-6, 1998